David Wang

David Wang is an accomplished professional with a strong educational background and diverse work experience.

He holds a Bachelor of Science degree in Materials Science and Engineering from the prestigious Massachusetts Institute of Technology, where he excelled with a GPA of 4.8 out of 5.0.

Prior to his university education, David Wang achieved a perfect GPA of 4.0 out of 4.0 in his High School Diploma at Monta Vista High School, showcasing his dedication to academic excellence from an early age.

David currently serves as a Resin Validation Engineer at Carbon, contributing his expertise to the field of engineering.

His previous roles include valuable experiences at renowned organizations such as Tesla, where he worked as an Engineering Intern, further honing his skills in the industry.

David also gained research experience during his time as an Undergraduate Researcher in the Yet-Ming Chiang Group at Massachusetts Institute of Technology.

His passion for teaching and sharing knowledge is evident through his role as a Teaching Assistant at Massachusetts Institute of Technology, where he guided and mentored students in their academic pursuits.

Additionally, David has interned at leading companies like Chevron and HP, where he gained practical insights and hands-on experience in the engineering and research fields.

His academic and professional journey also includes a notable stint as an Undergraduate Researcher at the esteemed Stephen J. Lippard Lab at Massachusetts Institute of Technology, highlighting his commitment to exploration and discovery in the realm of materials science and engineering.

David Wang's exceptional achievements extend beyond the realm of academics and work, as he has proudly represented Team USA and earned a Gold Medal at the International Chemistry Olympiad, showcasing his talents on a global stage.

With a rich tapestry of experiences and a deep passion for innovation, David Wang continues to make significant contributions to the field of Materials Science and Engineering.