Alok Ranjan

Alok Ranjan is a highly accomplished professional in the semiconductor industry, currently serving as a Fellow and Senior Technical Director at Tokyo Electron US.3 He holds a PhD in Chemical Engineering from the University of Houston, Texas.12

Professional Experience

Dr. Ranjan has an extensive background in plasma etch technology and semiconductor manufacturing. His career highlights include:

• Director & Senior Member of Technical Staff at Tokyo Electron Miyagi Ltd, Tokyo Electron's Etch Business Unit, and TEL Technology Center America1
• Responsible for global programs focused on advanced plasma etch process and chamber development for current through to 3 nm technologies in logic, memory, and patterning1
• Chair of the steering committee directing etch concept and feasibility development1
• Prior technology leadership roles at Intel and Applied Materials, where he deployed new process and chamber technologies for leading-node pilot line development1

Expertise and Contributions

Dr. Ranjan is known for his expertise in:

• Atomic layer etching in critical applications
• "Etch aware" computational patterning
• Plasma etch technology for semiconductor manufacturing

His contributions to the field are significant:

• Published over 100 articles and conference papers
• Filed or pending over 100 patents related to advanced semiconductor device manufacturing technology1
• Serves on numerous industry committees, including the AVS Program Committee and ALE workshop committee1

Education

• PhD in Chemical Engineering from the University of Houston, USA12
• BS in Chemical Engineering from Indian Institute of Technology1

Dr. Ranjan's work has been instrumental in advancing semiconductor manufacturing technologies, particularly in the area of plasma etching. His research at the University of Houston contributed to the development of the first ballistic electron beam-based plasma etchers, which are now in wide commercial use.1